Published June 1984
| Version v1
Journal article
Transitory UV resistance during germination of UV-sensitive spores produced by a mutant of Bacillus cereus 569
Creators
- 1. Weizmann Inst. of Science, Rehovoth (Israel). Dept. of Organic Chemistry
- 2. Israel Inst. for Biological Research, Nes Ziona
Description
A mutant of Bacillus cereus 569, designated 2422 is unable to excise cyclobutane-type dimers and spore-specific photoproducts from the DNA of UV-irradiated vegetative cells and dormant spores. The deficiency in the excision repair mechanism was found to be at the post-incision step in the exonuclease-mediated removal of the photoproducts. During germination, the mutant B. cereus 2422 exhibits UV-resistance and an efficient photoproduct removal which is followed by DNA repair synthesis. The data presented indicate the existence of germinative excision repair in B. cereus 569. (author)
Additional details
Publishing Information
- Journal Title
- Photochem. Photobiol.
- Journal Volume
- 39
- Journal Issue
- 6
- Series
- Photochem. Photobiol.
- Journal Page Range
- 775-780
- ISSN
- 0031-8655
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 16013627
- Subject category
- S63: RADIATION, THERMAL, AND OTHER ENVIRONMENTAL POLLUTANT EFFECTS ON LIVING ORGANISMS AND BIOLOGICAL MATERIALS;
- Descriptors DEI
- BACILLUS CEREUS; BACTERIAL SPORES; DNA REPAIR; MUTANTS; PHOTOSENSITIVITY; ULTRAVIOLET RADIATION
- Descriptors DEC
- BACILLUS; BACTERIA; BIOLOGICAL RECOVERY; BIOLOGICAL REPAIR; ELECTROMAGNETIC RADIATION; MICROORGANISMS; RADIATIONS; SENSITIVITY; SPORES