Published 2000
| Version v1
Miscellaneous
Generation of high intensity pulsed ion and plasma beams for material processing
- 1. The Andrzej Soltan Institute for Nuclear Studies, Otwock-Swierk (Poland)
- 2. Institute of Nuclear Chemistry and Technology, Warsaw (Poland)
Description
no abstract available
Additional details
Publishing Information
- Imprint Title
- Abstracts of 3. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2000
- Imprint Pagination
- 120 p.
- Journal Page Range
- p. 113
Conference
- Title
- 3. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2000
- Dates
- 12-15 Jun 2000
- Place
- Kazimierz Dolny (Poland)
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 32030064
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- CORROSION PROTECTION; ION BEAMS; ION SOURCES; JOINTS; PINCH DEVICES; PLASMA; PLASMA FOCUS DEVICES; PLASMA GUNS; SURFACE TREATMENTS; WEAR RESISTANCE
- Descriptors DEC
- BEAMS; MECHANICAL PROPERTIES; OPEN PLASMA DEVICES; THERMONUCLEAR DEVICES