Graphite edge controlled registration of monolayer MoS2 crystal orientation
Creators
- 1. Department of Physics, National Taiwan University, Taipei 10617, Taiwan (China)
- 2. Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan (China)
Description
Transition metal dichalcogenides such as the semiconductor MoS2 are a class of two-dimensional crystals. The surface morphology and quality of MoS2 grown by chemical vapor deposition are examined using atomic force and scanning tunneling microscopy techniques. By analyzing the moiré patterns from several triangular MoS2 islands, we find that there exist at least five different superstructures and that the relative rotational angles between the MoS2 adlayer and graphite substrate lattices are typically less than 3°. We conclude that since MoS2 grows at graphite step-edges, it is the edge structure which controls the orientation of the islands, with those growing from zig-zag (or armchair) edges tending to orient with one lattice vector parallel (perpendicular) to the step-edge
Additional details
Identifiers
- DOI
- 10.1063/1.4919923;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 106
- Journal Issue
- 18
- Journal Page Range
- p. 181904-181904.4
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46104694
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTALS; GRAPHITE; MOLYBDENUM SULFIDES; MORPHOLOGY; ORIENTATION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR MATERIALS; SUBSTRATES; SURFACES; TWO-DIMENSIONAL SYSTEMS
- Descriptors DEC
- CARBON; CHALCOGENIDES; CHEMICAL COATING; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DEPOSITION; ELEMENTS; MATERIALS; MICROSCOPY; MINERALS; MOLYBDENUM COMPOUNDS; NONMETALS; REFRACTORY METAL COMPOUNDS; SULFIDES; SULFUR COMPOUNDS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- (c) 2015 Author(s)