Published June 1996
| Version v1
Journal article
Development of high-dose and high-energy ion implantation
- 1. Beijing Univ. (China). Inst. of Heavy Ion Physics
Description
The development of high-dose ion implantation and high-energy ion implantation at the Ion Beam Application Group of IHIP in recent years is reviewed
Additional details
Publishing Information
- Journal Title
- Trends in Nuclear Physics
- Journal Volume
- 13
- Journal Issue
- 2
- Series
- Special Issue for Institute of Heavy Ion Physics of Beijing University.
- Journal Page Range
- p. 47-49.
- ISSN
- 1003-9988
- CODEN
- HEDOEW
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 28020514
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- DOSE RATES; ENERGY RANGE; ION BEAMS; ION IMPLANTATION; PHYSICAL RADIATION EFFECTS; REVIEWS; TARGETS
- Descriptors DEC
- BEAMS; DOCUMENT TYPES; RADIATION EFFECTS