Non-adiabatic ab initio molecular dynamics of supersonic beam epitaxy of silicon carbide at room temperature
Creators
- 1. Department of Chemistry, University of Bologna, Bologna (Italy)
- 2. Istituto Nazionale di Fisica Nucleare, Sezione di Perugia (Italy)
- 3. Department of Physics, University of Trento, Trento (Italy)
- 4. Interdisciplinary Laboratory for Computational Science, FBK-Center for Materials and Microsystems and University of Trento, Trento (Italy)
- 5. Department of Physics, University of Camerino, Camerino (Italy)
- 6. Institute of Materials for Electronics and Magnetism, IMEM-CNR, Trento (Italy)
- 7. Institut für Physik, Humboldt-Universität zu Berlin, Berlin (Germany)
- 8. Institute of Materials for Electronics and Magnetism, FBK-CNR, Trento (Italy)
- 9. Institute of Materials for Electronics and Magnetism, IMEM-CNR, Parma (Italy)
- 10. Istituto Nazionale di Fisica Nucleare, Sezione di Padova (Italy)
- 11. Department of Materials Engineering and Industrial Technologies, University of Trento, Trento (Italy)
Description
In this work, we investigate the processes leading to the room-temperature growth of silicon carbide thin films by supersonic molecular beam epitaxy technique. We present experimental data showing that the collision of fullerene on a silicon surface induces strong chemical-physical perturbations and, for sufficient velocity, disruption of molecular bonds, and cage breaking with formation of nanostructures with different stoichiometric character. We show that in these out-of-equilibrium conditions, it is necessary to go beyond the standard implementations of density functional theory, as ab initio methods based on the Born-Oppenheimer approximation fail to capture the excited-state dynamics. In particular, we analyse the Si-C60 collision within the non-adiabatic nuclear dynamics framework, where stochastic hops occur between adiabatic surfaces calculated with time-dependent density functional theory. This theoretical description of the C60 impact on the Si surface is in good agreement with our experimental findings.
Additional details
Identifiers
- DOI
- 10.1063/1.4774376;
Publishing Information
- Journal Title
- Journal of Chemical Physics
- Journal Volume
- 138
- Journal Issue
- 4
- Journal Page Range
- p. 044701-044701.8
- ISSN
- 0021-9606
- CODEN
- JCPSA6
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44063164
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- BORN-OPPENHEIMER APPROXIMATION; COLLISIONS; DENSITY FUNCTIONAL METHOD; EXCITED STATES; FULLERENES; MOLECULAR BEAM EPITAXY; MOLECULAR DYNAMICS METHOD; NANOSTRUCTURES; SEMICONDUCTOR MATERIALS; SILICON; SILICON CARBIDES; STOICHIOMETRY; SURFACES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TIME DEPENDENCE
- Descriptors DEC
- APPROXIMATIONS; CALCULATION METHODS; CARBIDES; CARBON; CARBON COMPOUNDS; CRYSTAL GROWTH METHODS; ELEMENTS; ENERGY LEVELS; EPITAXY; FILMS; MATERIALS; NONMETALS; SEMIMETALS; SILICON COMPOUNDS; TEMPERATURE RANGE; VARIATIONAL METHODS
Optional Information
- Notes
- (c) 2013 American Institute of Physics