Published July 24, 2000 | Version v1
Report Restricted

Ion Sources and Injectors for HIF Induction Linacs

Description

Ion source and injector development is one of the major parts of the HIF program in the USA. Our challenge is to design a cost effective driver-scale injector and to build a multiple beam module within the next couple of years. In this paper, several current-voltage scaling laws are summarized for guiding the injector design. Following the traditional way of building injectors for HIF induction linac, we have produced a preliminary design for a multiple beam driver-scale injector. We also developed an alternate option for a high current density injector that is much smaller in size. One of the changes following this new option is the possibility of using other kinds of ion sources than the surface ionization sources. So far, we are still looking for an ideal ion source candidate that can readily meet all the essential requirements

Availability note (English)

Available from INIS in electronic form; Also available from OSTI as DE00775119; PURL: https://www.osti.gov/servlets/purl/775119-aljUGq/webviewable/

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Additional details

Publishing Information

Imprint Pagination
19 p.
Report number
LBNL--45677

Conference

Title
13. International Heavy Ion Fusion Symposium HIF2000
Dates
12-17 Mar 2000
Place
San Diego, CA (United States)

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
33004726
Subject category
S43: PARTICLE ACCELERATORS; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CURRENT DENSITY; DESIGN; HEAVY ION FUSION REACTIONS; HEAVY IONS; ION BEAM INJECTION; ION SOURCES; LINEAR ACCELERATORS; SCALING LAWS; SURFACE IONIZATION
Descriptors DEC
ACCELERATORS; BEAM INJECTION; CHARGED PARTICLES; HEAVY ION REACTIONS; IONIZATION; IONS; NUCLEAR REACTIONS; NUCLEOSYNTHESIS; SYNTHESIS

Optional Information

Contract/Grant/Project number
AC03-76SF00098
Funding organization
USDOE Director, Office of Science (United States)
Secondary number(s)
HIFAN--1031