Nanoplasmonic Phenomena at Electronic Boundaries in Graphene
Creators
- 1. Ames Laboratory and Iowa State University, Ames, IA (United States)
- 2. University of California, San Diego, La Jolla, CA (United States)
- 3. Columbia University, New York, NY (United States)
Description
Here, we review recent discoveries of the intriguing plasmonic phenomena at a variety of electronic boundaries (EBs) in graphene including a line of charges in graphene induced by a carbon nanotube gate, grain boundaries in chemical vapor deposited graphene films, an interface between graphene and moiré patterned graphene, an interface between graphene and bilayer graphene, and others. All these and other EBs cause plasmonic impedance mismatch at the two sides of the boundaries. Manifestations of this effect include plasmonic fringes that stem from plasmon reflections and interference. Quantitative analysis and modeling of these plasmonic fringes uncovered intriguing properties and underlying physics of the EBs. Potential plasmonic applications associated with these EBs are also briefly discussed.
Availability note (English)
Available from http://www.osti.gov/pages/biblio/1417351; DOE Accepted Manuscript full text, or the publishers Best Available Version will be available free of charge after the embargo periodAdditional details
Identifiers
Publishing Information
- Journal Title
- ACS Photonics
- Journal Volume
- 4
- Journal Issue
- 12
- Journal Page Range
- p. 2971-2977
- ISSN
- 2330-4022
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 49062661
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; GRAIN BOUNDARIES; GRAPHENE; PLASMONS
- Descriptors DEC
- CARBON; CHEMICAL COATING; DEPOSITION; ELEMENTS; MICROSTRUCTURE; NANOSTRUCTURES; NANOTUBES; NONMETALS; QUASI PARTICLES; SURFACE COATING
Optional Information
- Contract/Grant/Project number
- ARO-DURIP; GBMF4533; FA9550-15-1-0478; N00014-15-1-2671; AC02-07CH11358
- Funding organization
- USDOE (United States)
- Secondary number(s)
- IS-J--9551; OSTIID--1417351