Published August 15, 2003 | Version v1
Journal article

Cathodoluminescence study of carrier diffusion in AlGaN

  • 1. Laboratoire de Structure et Proprietes de l'Etat Solide, UMR CNRS 8008, Batiment C6, Universite des Sciences et Technologies de Lille, 59655 Villeneuve d'Ascq Cedex (France)
  • 2. CEA Grenoble, DSM/DRFMC/SP2M, 17 rue des Martyrs, F-38054 Grenoble Cedex 9 (France)

Description

This article presents a method to estimate the carrier diffusion length in the optical waveguide region of a separate confinement heterostructure (SCH) semiconductor laser. The electron incident energy dependence of waveguide and active region cathodoluminescence yields are compared with a Monte Carlo simulation of ionization processes. This procedure is applied to a SCH consisting of GaN quantum dots inserted in an Al0.27Ga0.73N/AlN optical waveguide grown by plasma assisted molecular-beam epitaxy on 6H-SiC. A diffusion length of 7.5 nm is estimated in AlGaN material at room temperature

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
94
Journal Issue
4
Journal Page Range
p. 2755-2757
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2003 American Institute of Physics.