Published February 1975
| Version v1
Journal article
Production of highly ionized plasma
Creators
- 1. Institute of Physical and Chemical Research, Wako, Saitama (Japan)
Description
no abstract available
Additional details
Identifiers
- DOI
- 10.1143/jjap.14.313;
Publishing Information
- Journal Title
- Japanese Journal of Applied Physics
- Journal Volume
- 14
- Journal Issue
- 2
- Series
- Jpn. J. Appl. Phys.
- Journal Page Range
- 313-314
- ISSN
- 0021-4922
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 7231847
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- ELECTRON CYCLOTRON-RESONANCE; ELECTRON DENSITY; GHZ RANGE; IONIZATION; LANGMUIR PROBE; MAGNETIC MIRRORS; MICROWAVE RADIATION; PLASMA DENSITY; PLASMA PRODUCTION; SPATIAL DISTRIBUTION
- Descriptors DEC
- CYCLOTRON RESONANCE; DISTRIBUTION; ELECTRIC PROBES; ELECTROMAGNETIC RADIATION; FREQUENCY RANGE; OPEN PLASMA DEVICES; PROBES; RADIATIONS; RESONANCE; THERMONUCLEAR DEVICES
Optional Information
- Notes
- Letter-to-the-editor.; Updated automatically by Metadata and Full-Text Enrichment Agent