Published August 1985 | Version v1
Journal article

Studies on the photochemistry of uranyl ion : Pt. 3

  • 1. Academia Sinica, Beijing, BJ (China). Inst. of Atomic Energy

Description

The photochemical reduction of uranyl ion by formic acid is investigated using an argon ion laser at wavelength 4880 A. The effects of concentration of the formic acid, formate, nitric acid, nitrate, uranyl ion and of temperature on quantum yield PHI of U(IV) formed are studied. Experimental results indicate that U(VI) can be reduced photochemically to U(V), which disproportionates to U(IV) and U(VI). PHI depends mainly on the degree of complex formation of uranyl formate in solution. PHI increases with the increase of α. PHI reaches 0.5 when α is close to 1. The rate of U(IV) formed is proportional to [HCOO-]sup(1.08) at low concentration of formate and to [UO22+]sup(1.01) at low concentration of uranyl ion respectively

Additional details

Additional titles

Subtitle (English)
Photochemical reduction of U(VI) in UO_2"2"+-HCOOH-HNO_3 system with an argon ion laser

Publishing Information

Journal Title
J. Nucl. Radiochem.
Journal Volume
7
Journal Issue
3
Series
J. Nucl. Radiochem.
Journal Page Range
141-146, 154
ISSN
0253-9950
CODEN
HHHHD