Published May 1988 | Version v1
Journal article

Microporosity and adhesion of ion bombarded thin silicon surface films

  • 1. Heidelberg Univ. (Germany, F.R.). Physikalisch-Chemisches Inst.

Description

Adhesion tests and electrochemical measurements were performed on thin silicon films evaporated onto steel to evaluate the influence of ion bombardment on mechanical properties, corrosion protection potential and microporosity. The results are compared to those obtained by a combined process, i.e. ion bombardment during evaporation. (orig.)

Additional details

Publishing Information

Journal Title
Nucl. Instrum. Methods Phys. Res., Sect. B
Journal Volume
32
Journal Issue
1-4
Series
Nucl. Instrum. Methods Phys. Res., Sect. B.
Journal Page Range
104-110
ISSN
0168-583X
CODEN
NIMBE

Conference

Title
4. international conference on radiation effects in insulators - including the workshop on radiation damage in nuclear waste materials.
Dates
6-10 Jul 1987.
Place
Lyon (France).