Effects of annealing on thermochromic properties of W-doped vanadium dioxide thin films deposited by electron beam evaporation
- 1. Department of Materials Science and Engineering, National Cheng Kung University, Tainan 70101, Taiwan (China)
- 2. Department of Mechanical Engineering, National Chin-Yi University of Technology, Taichung 41170, Taiwan (China)
- 3. Research Center for Energy Technology and Strategy, National Cheng Kung University, Tainan 70101, Taiwan (China)
- 4. Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan (China)
Description
Highlights: • Crystal structure change of VO2 and W-doped VO2 thin films caused by post annealing treatment • W-doping affects the electric structure of VO2 thin films. • The optical performance of W-doped VO2 thin films shows good IR shielding ability. - Abstract: Thermochromic vanadium dioxide (VO2) undergoes a fully reversible semiconductor-metal transition (SMT) at a critical temperature (Tt) of ~ 68 °C with a dramatic change in electric and optical properties, which makes it an attractive candidate for its application in smart windows. Switchable VO2 and W-doped vanadium dioxide (WxV1−xO2) thin films are grown over quartz substrates via electron beam evaporation technique by using VO2/WxV1−xO2 as targets at room temperature (RT) followed by post annealing process at different temperatures. The as-deposited films are amorphous, and that transform to monoclinic VO2 (VO2(M)) with (011)-preferred orientation after annealing at 500 °C under vacuum. The (011) peak of W-doped VO2 films shifts to a lower diffraction angle as compared with un-doped VO2 films which confirms the incorporation of W ions into the VO2 lattice. Temperature dependent optical transmittance measurement demonstrates the thermochromic properties, with a reduction in the phase transition temperature (Tt) as observed in W-doped VO2 films, which is attributed to the variation of electron structure in VO2 due to doping. The films are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and optical transmittance measurement.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2017.05.052Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2017.05.052;
- PII
- S0040609017306491;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 644
- Journal Page Range
- p. 52-56
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50035232
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANNEALING; CRITICAL TEMPERATURE; DOPED MATERIALS; ELECTRON BEAMS; ELECTRONIC STRUCTURE; MONOCLINIC LATTICES; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SUBSTRATES; THIN FILMS; TUNGSTEN ADDITIONS; VANADIUM OXIDES; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- ALLOYS; BEAMS; CHALCOGENIDES; COHERENT SCATTERING; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; FILMS; HEAT TREATMENTS; LEPTON BEAMS; MATERIALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; SCATTERING; SPECTROSCOPY; THERMODYNAMIC PROPERTIES; THREE-DIMENSIONAL LATTICES; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENT COMPOUNDS; TRANSITION TEMPERATURE; TUNGSTEN ALLOYS; VANADIUM COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.