Published December 2017 | Version v1
Journal article

Effects of annealing on thermochromic properties of W-doped vanadium dioxide thin films deposited by electron beam evaporation

  • 1. Department of Materials Science and Engineering, National Cheng Kung University, Tainan 70101, Taiwan (China)
  • 2. Department of Mechanical Engineering, National Chin-Yi University of Technology, Taichung 41170, Taiwan (China)
  • 3. Research Center for Energy Technology and Strategy, National Cheng Kung University, Tainan 70101, Taiwan (China)
  • 4. Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan (China)

Description

Highlights: • Crystal structure change of VO2 and W-doped VO2 thin films caused by post annealing treatment • W-doping affects the electric structure of VO2 thin films. • The optical performance of W-doped VO2 thin films shows good IR shielding ability. - Abstract: Thermochromic vanadium dioxide (VO2) undergoes a fully reversible semiconductor-metal transition (SMT) at a critical temperature (Tt) of ~ 68 °C with a dramatic change in electric and optical properties, which makes it an attractive candidate for its application in smart windows. Switchable VO2 and W-doped vanadium dioxide (WxV1−xO2) thin films are grown over quartz substrates via electron beam evaporation technique by using VO2/WxV1−xO2 as targets at room temperature (RT) followed by post annealing process at different temperatures. The as-deposited films are amorphous, and that transform to monoclinic VO2 (VO2(M)) with (011)-preferred orientation after annealing at 500 °C under vacuum. The (011) peak of W-doped VO2 films shifts to a lower diffraction angle as compared with un-doped VO2 films which confirms the incorporation of W ions into the VO2 lattice. Temperature dependent optical transmittance measurement demonstrates the thermochromic properties, with a reduction in the phase transition temperature (Tt) as observed in W-doped VO2 films, which is attributed to the variation of electron structure in VO2 due to doping. The films are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and optical transmittance measurement.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2017.05.052

Additional details

Identifiers

DOI
10.1016/j.tsf.2017.05.052;
PII
S0040609017306491;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
644
Journal Page Range
p. 52-56
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.