Current state and prospects of industrial application of electron beam irradiation
Creators
- 1. Waseda University, Research Institute for Science and Engineering, Tokyo (Japan)
Description
This paper reviewed the low energy, medium energy, and high energy accelerators used for the industrial application of electron beams. Next, it described the absorption of electron beam energy, distribution of the absorbed dose of electron beams in a substance, and the basis of electron beam reaction. Furthermore, as the industrial application examples of electron beams, it briefly described about the reforming and curing of polymers, irradiation effect of inorganic material (characteristic control of semiconductors), and sterilization. Regarding curing, as examples using mainly low energy electron beams (300 keV or below), this paper briefly explained the manufacture of thermosensitive recording materials, electron beam cured silicone for release papers, tunnel metal interior finishing board, high gloss - high smooth paper. Finally, it looked at latest trends and prospects of electron beam generators. (A.O.)
Additional details
Publishing Information
- Journal Title
- Oyo Kasokuki Oyobi Kanren Gijutsu Teirei Kenkyukai Shiryoshu
- Journal Volume
- 1
- Journal Page Range
- p. 15-29
- ISSN
- 1345-5095
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 48034424
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES;
- Descriptors DEI
- ACCELERATORS; CROSS-LINKING; ELECTRON BEAMS; ENERGY ABSORPTION; IRRADIATION DEVICES; RADIATION CURING; SEMICONDUCTOR DIODES; SILICONES; SPATIAL DOSE DISTRIBUTIONS; STERILIZATION; SURFACE COATING
- Descriptors DEC
- ABSORPTION; BEAMS; CHEMICAL RADIATION EFFECTS; CHEMICAL REACTIONS; CURING; DEPOSITION; LEPTON BEAMS; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; PARTICLE BEAMS; POLYMERIZATION; POLYMERS; RADIATION DOSE DISTRIBUTIONS; RADIATION EFFECTS; SEMICONDUCTOR DEVICES; SILOXANES; SORPTION
Optional Information
- Notes
- 26 refs., 4 figs., 1 tab.