X-ray analytical system
Description
A method is given for the on-line analysis of slurries using x-ray fluorescence which allows for corrections due to variations in slurry particle size and for interference from other elements present. The mixture is exposed to a heterochromatic beam of primary x rays that includes wavelengths capable of exciting x ray re-emissions from the mixture at (a) a wavelength characteristic of the element of interest, (b) a soft wavelength different from any wavelength characteristic of the element, and (c) a hard wavelength different from any wavelength characteristic of the element. The intensities of the respective x ray emissions at each of the three wavelengths are measured, and the apparent concentration of the element indicated by the intensity of the re-emission at wavelength (a) is corrected for the influence of the matrix as determined by the intensities at wavelengths (b) and (c)
Availability note (English)
Available from Micromedia Ltd., 165 Hotel de Ville, Hull, Quebec, Canada J8X 3X2.Additional details
Publishing Information
- Imprint Pagination
- 50 p.
- IPC:
- Int. Cl. G01t1/29.
- IPC
- Int. Cl. G01t1/29.
- Patent number
- CA patent document 1111150/A/
INIS
- Country of Publication
- Canada
- Country of Input or Organization
- Canada
- INIS RN
- 13703220
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- PARTICLE SIZE; SLURRIES; SOLIDS; X-RAY FLUORESCENCE ANALYSIS; X-RAY FLUORESCENCE ANALYZERS
- Descriptors DEC
- CHEMICAL ANALYSIS; DISPERSIONS; MIXTURES; NONDESTRUCTIVE ANALYSIS; SIZE; SUSPENSIONS; X-RAY EMISSION ANALYSIS
Optional Information
- Notes
- U.S. pat. appl. 842522 (17 Oct 1977).