Published October 20, 1981 | Version v1
Patent

X-ray analytical system

Description

A method is given for the on-line analysis of slurries using x-ray fluorescence which allows for corrections due to variations in slurry particle size and for interference from other elements present. The mixture is exposed to a heterochromatic beam of primary x rays that includes wavelengths capable of exciting x ray re-emissions from the mixture at (a) a wavelength characteristic of the element of interest, (b) a soft wavelength different from any wavelength characteristic of the element, and (c) a hard wavelength different from any wavelength characteristic of the element. The intensities of the respective x ray emissions at each of the three wavelengths are measured, and the apparent concentration of the element indicated by the intensity of the re-emission at wavelength (a) is corrected for the influence of the matrix as determined by the intensities at wavelengths (b) and (c)

Availability note (English)

Available from Micromedia Ltd., 165 Hotel de Ville, Hull, Quebec, Canada J8X 3X2.

Additional details

Publishing Information

Imprint Pagination
50 p.
IPC:
Int. Cl. G01t1/29.
IPC
Int. Cl. G01t1/29.
Patent number
CA patent document 1111150/A/

INIS

Country of Publication
Canada
Country of Input or Organization
Canada
INIS RN
13703220
Subject category
S07: ISOTOPES AND RADIATION SOURCES; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
PARTICLE SIZE; SLURRIES; SOLIDS; X-RAY FLUORESCENCE ANALYSIS; X-RAY FLUORESCENCE ANALYZERS
Descriptors DEC
CHEMICAL ANALYSIS; DISPERSIONS; MIXTURES; NONDESTRUCTIVE ANALYSIS; SIZE; SUSPENSIONS; X-RAY EMISSION ANALYSIS

Optional Information

Notes
U.S. pat. appl. 842522 (17 Oct 1977).