Published December 3, 1993
| Version v1
Journal article
Some metal vapour ionization measurements in plasma beam evaporation systems
Description
The influence of the plasma configuration on the coating rate was investigated for a plasma beam ion plating system. The influence of substrate polarization, magnetic fields and shielding grids on the deposition rate can be used to estimate the ionized fraction of the metal vapour. The results are complemented by some Langmuir probe measurements. (orig.)
Additional details
Publishing Information
- Journal Title
- Surface and Coatings Technology
- Journal Volume
- 61
- Journal Issue
- 1-3
- Journal Page Range
- p. 300-304.
- ISSN
- 0257-8972
- CODEN
- SCTEEJ
Conference
- Title
- 20. international conference on metallurgical coatings and thin films (ICMCTF).
- Dates
- 18-23 Apr 1993.
- Place
- San Diego, CA (United States).
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Switzerland
- INIS RN
- 25035466
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM-PLASMA SYSTEMS; COATINGS; ELECTRIC CONDUCTIVITY; EVAPORATION; ION BEAMS; IONIZATION; LANGMUIR PROBE; MAGNETIC FIELDS; METALS; PLASMA DIAGNOSTICS; PLASMA WAVES; POLARIZATION; SHIELDING; THICKNESS
- Descriptors DEC
- BEAMS; DIMENSIONS; ELECTRIC PROBES; ELECTRICAL PROPERTIES; ELEMENTS; PHASE TRANSFORMATIONS; PHYSICAL PROPERTIES; PROBES