Published May 1990 | Version v1
Journal article

Microwave plasma source for ion sources with multipolar and axial magnetic fields

  • 1. Tokyo Univ. (Japan). Faculty of Engineering

Description

A microwave (2.45 GHz) plasma source for ion sources has been constructed and its characteristics have been examined. It consists of the part of the source generating a plasma and that making the plasma uniform. The experiments have been conducted in four kinds of magnetic field configurations generated by solenoid coils and arrays of permanent magnets. The plasma parameters have been measured with a Langmuir probe located at 2 cm above a plasma grid. The uniform plasma over an area of 8∼10 cm·φ in diameter and the density of 2.6 x 1011 cm-3 has been produced. The magnetic field intensity near the plasma grid is nearly zero. (author)

Additional details

Publishing Information

Journal Title
Japanese Journal of Applied Physics, Part 2
Journal Volume
29
Journal Issue
5
Series
Jpn. J. Appl. Phys., Part 2.
Journal Page Range
L822-L825
ISSN
0021-4922
CODEN
JAPLD