Published May 1990
| Version v1
Journal article
Microwave plasma source for ion sources with multipolar and axial magnetic fields
- 1. Tokyo Univ. (Japan). Faculty of Engineering
Description
A microwave (2.45 GHz) plasma source for ion sources has been constructed and its characteristics have been examined. It consists of the part of the source generating a plasma and that making the plasma uniform. The experiments have been conducted in four kinds of magnetic field configurations generated by solenoid coils and arrays of permanent magnets. The plasma parameters have been measured with a Langmuir probe located at 2 cm above a plasma grid. The uniform plasma over an area of 8∼10 cm·φ in diameter and the density of 2.6 x 1011 cm-3 has been produced. The magnetic field intensity near the plasma grid is nearly zero. (author)
Additional details
Publishing Information
- Journal Title
- Japanese Journal of Applied Physics, Part 2
- Journal Volume
- 29
- Journal Issue
- 5
- Series
- Jpn. J. Appl. Phys., Part 2.
- Journal Page Range
- L822-L825
- ISSN
- 0021-4922
- CODEN
- JAPLD
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 21084597
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ELECTRON CYCLOTRON-RESONANCE; ELECTRON DENSITY; ION SOURCES; MAGNETIC FIELDS; MICROWAVE RADIATION; PLASMA; PLASMA DENSITY; PRESSURE DEPENDENCE; TEMPERATURE DEPENDENCE
- Descriptors DEC
- CYCLOTRON RESONANCE; ELECTROMAGNETIC RADIATION; RADIATIONS; RESONANCE