Published October 2001 | Version v1
Journal article Metadata-only

Study on the mechanism of the deposition process of KTN thin film by pulsed laser

Creators

  • 1. Huazhong Univ. of Science and Technology, Wuhan (China). Dept. of Physics
  • 2. Xiangfang College, Xiangfang (China). Dept. of Physics

Description

According to energy balance consideration, the ablation ratio formula of target irradiated by pulsed laser is derived, and the spatial-characteristic equations of plasma generated by pulsed laser are obtained by using fluid dynamic theory. Combining the ablation ratio formula with the spatial-characteristic equations of plasma, the effects of different laser power density and wavelength on the deposition characteristics of Kta0.65Nb0.35O3(KTN) thin film are studied on the basis of authors' experiments. And many valuable results are obtained which have been discussed in detail. The calculated results are in agreement with experiments on the whole

Additional details

Publishing Information

Journal Title
Acta Physica Sinica
Journal Volume
50
Journal Issue
10
Journal Page Range
p. 1950-1955
ISSN
1000-3290

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
33018578
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ABLATION; DEPOSITION; ENERGY BALANCE; FLUID MECHANICS; LASER RADIATION; NIOBATES; PLASMA; POTASSIUM COMPOUNDS; TANTALUM COMPOUNDS; THIN FILMS
Descriptors DEC
ALKALI METAL COMPOUNDS; ELECTROMAGNETIC RADIATION; FILMS; MECHANICS; NIOBIUM COMPOUNDS; OXYGEN COMPOUNDS; RADIATIONS; REFRACTORY METAL COMPOUNDS; TRANSITION ELEMENT COMPOUNDS