Study of the outgassing behavior of SnO2:F films on glass in vacuum under external energy excitation
- 1. Nippon Sheet Glass Co., Ltd., 469 Oyabu-cho Kuze, Minami-ku, Kyoto 601-8206 (Japan)
- 2. NSG Techno-Research Co., Ltd., Tsukuba, Ibaraki 300-2635 (Japan)
- 3. Nagoya Institute of Technology, Graduate School of Engineering, Nagoya, Aichi 466-8555 (Japan)
Description
Vacuum glazing consists of an evacuated space between two sheets of glass. Vacuum glazing has a large effect on energy savings in houses and buildings. Vacuum glazing can achieve higher insulating performance than conventional insulated glazing. Nippon Sheet Glass has successfully developed conventional vacuum glazing. In this study we investigated an advanced form of vacuum glazing. Its thermal insulation ability is equivalent to 100 mm thick glass wool thermal insulation. This vacuum glazing contained a SnO2:F low emissivity surface. The influence of the residual gas in a vacuum space on heat flow is important to performance. For long-term thermal stability, it is very important to maintain vacuum stability. To understand this better, we studied the behavior of outgassing from the inside glass surfaces exposed to an external energy source. We have studied the behavior of outgassing from a glass surface using a Nd:YAG laser (operated at 355 nm wavelength) and Q-mass spectroscopy in vacuum. As a result, we identified both carbon compounds and water as outgassing products. The behavior of the carbon compound (mass number 44) was different from water (mass number 18). We investigated the relationship between outgassing behavior, baking temperature and laser intensity. Surface analysis was performed on the glass surface. As a result of XPS analysis on the glass surface, the amount of carbon compound observed was a function of baking temperature. SIMS showed that the amount of adsorbed carbon in the SnO2:F film was reduced with the increasing baking temperature, and with UV irradiation. For samples baked at 400 deg. C in vacuum, the carbon adsorption in SnO2:F film does not show significant difference between before and after UV irradiation
Additional details
Identifiers
- DOI
- 10.1016/j.mseb.2004.12.093;
- PII
- S0921-5107(05)00020-6;
Publishing Information
- Journal Title
- Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
- Journal Volume
- 119
- Journal Issue
- 3
- Journal Page Range
- p. 252-257
- ISSN
- 0921-5107
- CODEN
- MSBTEK
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37114589
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ADSORPTION; CARBON; CARBON COMPOUNDS; DEGASSING; EMISSIVITY; EXCITATION; FILMS; GLASS; GLAZING MATERIALS; HEAT FLUX; INTERFACES; IRRADIATION; LASERS; MASS SPECTROSCOPY; PERFORMANCE; PHASE STABILITY; SURFACES; THERMAL INSULATION; TIN OXIDES; WATER; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHALCOGENIDES; ELECTRON SPECTROSCOPY; ELEMENTS; ENERGY-LEVEL TRANSITIONS; HYDROGEN COMPOUNDS; MATERIALS; NONMETALS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; SORPTION; SPECTROSCOPY; STABILITY; SURFACE PROPERTIES; TIN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.