Published 1990
| Version v1
Book
Investigation of the radiation tolerance of amorphous silicon photodiodes for radiotherapy imaging
- 1. Dept. of Radiation Oncology and Physics, Univ. of Michigan, Ann Arbor, MI (USA)
- 2. Xerox Palo Alto Research Center, CA (United States)
Description
The increase radiation tolerance of structures constructed from hydrogenated amorphous silicon over similar devices constructed from crystalline silicon makes them particularly suitable for applications involving high radiation fields. One such application is in radiotherapy X-ray imaging where any detector will be exposed to the full radiation treatment beam. This paper reports the results of the 104Gy irradiation of photodiode sensors suitable for such an application and shows that they do indeed exhibit radiation tolerance. Transient effects associated with the sensors and their intensifying screens are also reported
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- IEEE nuclear science symposium conference record emdash 1990
- Imprint Pagination
- 1636 p.
- Journal Page Range
- p. 897.
Conference
- Title
- 1990 Institute of Electrical and Electronics Engineers (IEEE) nuclear science symposium.
- Dates
- 22-27 Oct 1990.
- Place
- Arlington, VA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22090308
- Subject category
- S62: RADIOLOGY AND NUCLEAR MEDICINE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BIOMEDICAL RADIOGRAPHY; IRRADIATION; PHOTODIODES; RADIATION EFFECTS; SILICON; TRANSIENTS; X RADIATION
- Descriptors DEC
- DIAGNOSTIC TECHNIQUES; ELECTROMAGNETIC RADIATION; ELEMENTS; IONIZING RADIATIONS; MEDICINE; RADIATIONS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SEMIMETALS
Optional Information
- Secondary number(s)
- CONF-9010220--.