Published 1990 | Version v1
Book

Investigation of the radiation tolerance of amorphous silicon photodiodes for radiotherapy imaging

  • 1. Dept. of Radiation Oncology and Physics, Univ. of Michigan, Ann Arbor, MI (USA)
  • 2. Xerox Palo Alto Research Center, CA (United States)

Description

The increase radiation tolerance of structures constructed from hydrogenated amorphous silicon over similar devices constructed from crystalline silicon makes them particularly suitable for applications involving high radiation fields. One such application is in radiotherapy X-ray imaging where any detector will be exposed to the full radiation treatment beam. This paper reports the results of the 104Gy irradiation of photodiode sensors suitable for such an application and shows that they do indeed exhibit radiation tolerance. Transient effects associated with the sensors and their intensifying screens are also reported

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
IEEE nuclear science symposium conference record emdash 1990
Imprint Pagination
1636 p.
Journal Page Range
p. 897.

Conference

Title
1990 Institute of Electrical and Electronics Engineers (IEEE) nuclear science symposium.
Dates
22-27 Oct 1990.
Place
Arlington, VA (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
22090308
Subject category
S62: RADIOLOGY AND NUCLEAR MEDICINE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BIOMEDICAL RADIOGRAPHY; IRRADIATION; PHOTODIODES; RADIATION EFFECTS; SILICON; TRANSIENTS; X RADIATION
Descriptors DEC
DIAGNOSTIC TECHNIQUES; ELECTROMAGNETIC RADIATION; ELEMENTS; IONIZING RADIATIONS; MEDICINE; RADIATIONS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SEMIMETALS

Optional Information

Secondary number(s)
CONF-9010220--.