Published May 2010 | Version v1
Journal article

Effect of resonance in external radio-frequency circuit on very high frequency plasma discharge

  • 1. Applied Materials, Inc., 974 E. Arques Avenue, M/S 81517 Sunnyvale, California 94085 (United States)

Description

A fully electromagnetic plasma model for an asymmetric capacitively coupled plasma discharge is used to understand the interaction between the external radio-frequency (rf) distributed circuit and the plasma. The plasma is excited using a 150 MHz rf source connected to the top electrode, the bottom electrode is connected to a shorted transmission line, and the electrodes are separated from the chamber walls through dielectric rings. Under typical conditions, the electron density peaks in the center of the plasma chamber due to the standing electromagnetic wave and the rf current from the top electrode primarily returns through the bottom electrode. When the electrical length of the bottom transmission line is adjusted such that it presents a large (open-circuit) impedance at the plasma chamber interface, the rf return current shifts from the bottom electrode to the chamber wall. As a consequence, the peak in electron density also moves from the center of the chamber toward its outer periphery.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
107
Journal Issue
9
Journal Page Range
p. 093302-093302.6
ISSN
0021-8979
CODEN
JAPIAU

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42069616
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ASYMMETRY; ELECTRODES; ELECTRON DENSITY; HIGH-FREQUENCY DISCHARGES; IMPEDANCE; MHZ RANGE; PLASMA; PLASMA DENSITY; PLASMA SIMULATION; RADIOWAVE RADIATION; RESONANCE
Descriptors DEC
ELECTRIC DISCHARGES; ELECTROMAGNETIC RADIATION; FREQUENCY RANGE; RADIATIONS; SIMULATION

Optional Information

Notes
(c) 2010 American Institute of Physics