Published September 2011 | Version v1
Journal article

Molecular beam epitaxy growth of PbSe on Si (211) using a ZnTe buffer layer

  • 1. Microphysics Laboratory, Physics Department, University of Illinois at Chicago, Illinois 60607 and EPIR Technologies, Bolingbrook, Illinois 60440 (United States)
  • 2. EPIR Technologies, Bolingbrook, Illinois 60440 (United States)
  • 3. Microphysics Laboratory, Physics Department, University of Illinois at Chicago, Illinois 60607 (United States)
  • 4. Microphysics Laboratory, Physics Department, University of Illinois at Chicago, Illinois 60607 and Physics Department and Quantum Functional Semiconductor Research Center, Dongguk University 3-26, Seoul 100-715 (Korea, Republic of)

Description

The authors report the results of successful growth of single crystalline PbSe on Si (211) substrates with ZnTe as a buffer layer by molecular beam epitaxy. Single crystalline PbSe with (511) orientation was achieved on ZnTe/Si (211), as evidenced by RHEED patterns indicative of 2 dimensional (2D) growth, x ray diffraction rocking curves with a full width at half maximum as low as 153 arc sec and mobility as large as 1.1x104cm2V-1s-1 at 77 K. Cross hatch patterns were found on the PbSe(511) surface in Nomarski filtered microscope images suggesting the presence of a surface thermal strain relaxation mechanism, which was confirmed by Fourier transformed high resolution transmission electron microscope images.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
Journal Volume
29
Journal Issue
5
Journal Page Range
p. 051503-051503.5
ISSN
1553-1813

Optional Information

Notes
(c) 2011 American Vacuum Society