Published November 1, 2002
| Version v1
Journal article
Effects of niobium doping on microstructures and ferroelectric properties of bismuth titanate ferroelectric thin films
Description
Bi4Ti3O12 thin films doped with 3 mol.% niobium were prepared on Pt/Ti/SiO2/Si substrates by sol-gel method. The niobium-doped Bi4Ti3O12 (Nb-BiTiO) films annealed at 700 deg. C for 30 min in oxygen showed randomly oriented layered perovskite structures and was composed of plate-like and rod-like grains with no crack. The remanent polarization (2Pr) and coercive field (2Ec) of the Nb-BiTiO film annealed at 700 deg. C were 28 μC/cm2 and 110 kV/cm, respectively. In addition, the film showed good switching endurance under bipolar pulse at least up to 4.5x1010 cycles. Substitution of Nb in BiTiO thin films was effective for reducing the oxygen vacancies and generating good ferroelectric properties
Additional details
Identifiers
- PII
- S0040609002005503;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 419
- Journal Issue
- 1-2
- Journal Page Range
- p. 225-229
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37001458
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; BISMUTH COMPOUNDS; CAPACITORS; DOPED MATERIALS; MICROSTRUCTURE; NIOBIUM; PEROVSKITE; SCANNING ELECTRON MICROSCOPY; SILICON OXIDES; SOL-GEL PROCESS; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; TITANATES; VACANCIES; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DIFFRACTION; ELECTRICAL EQUIPMENT; ELECTRON MICROSCOPY; ELEMENTS; EQUIPMENT; FILMS; HEAT TREATMENTS; MATERIALS; METALS; MICROSCOPY; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PEROVSKITES; POINT DEFECTS; REFRACTORY METALS; SCATTERING; SILICON COMPOUNDS; TEMPERATURE RANGE; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2002 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.