Published September 2005 | Version v1
Miscellaneous

Development of ultra precision aspherical form measurement equipment for synchrotron radiation mirror. Measurement of hard X-ray focusing mirror and comparison of interferometer

  • 1. Osaka University, Research Center for Ultra-Precision Science and Technology, Suita, Osaka (Japan)
  • 2. High Energy Accelerator Research Organization, Tsukuba, Ibaraki (Japan)

Description

A new ultra-precision profiler was developed to measure X-ray and EUV optics such as asymmetric and aspheric profiles. In the present study, the normal vectors at each points on the surface are determined by the reflected light beam goes back exactly on the same path as the incident beam. The surface gradients at each point are calculated from the normal vector and the surface profile is obtained by integrating the gradient. An elliptical profile mirror for nanometer hard X-ray focusing were measured using the present instrument and compared to the measured profile using Zygo phase-measuring interferometer. The absolute measurement accuracy of approximately 5 nm (P-V) was achieved. (author)

Part of:
Proceedings of 2005 Japan Society for Precision Engineering autumn conference

Additional details

Additional titles

Original title (Japanese)
2005 seimitsu-kogakkai shuki taikai gakujutsu koenkai koen ronbunshu

Publishing Information

Imprint Title
Proceedings of 2005 Japan Society for Precision Engineering autumn conference
Imprint Pagination
1276 p.
Journal Page Range
p. 349-350

Conference

Title
2005 Japan Society for Precision Engineering autumn conference
Dates
15-17 Sep 2005
Place
Kyoto (Japan)

Optional Information

Notes
Imprint:This CD-ROM can be used for WINDOWS 9x/NT/2000/ME/XP/VISTA, MACINTOSH; Acrobat Reader is included; Data in PDF format, Folder Name pdf, Paper ID E14.pdf