Flexible terahertz modulators based on graphene FET with organic high-k dielectric layer
Creators
- 1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 611731 (China)
- 2. School of Electrical Engineer and Intelligentization, Dongguan University of Technology, Dongguan 523808 (China)
- 3. Microsystem and Terahertz Research Center, CAEP, Chengdu 610200 (China)
Description
Graphene field-effect-transistor (GFET) based terahertz (THz) modulators usually possess an unfulfilling modulation depth (MD) of 15% ∼ 20%. In this work we developed a flexible GFET based THz modulator, where the graphene monolayer is coated with an organic high-K dielectric as the screening layer and an ion-gel layer as the gate. With this exquisite composite modulating structure, the new device possesses a significantly enhanced modulation depth (MD) up to 70% over a broad frequency band, an extremely low insert loss (IL) of 1.3 dB, and unexpected good structural and properties stability. The large intrinsic MD, low IL, as well as its flexibility, render this performance enhanced modulator versatile in fabrication of novel THz devices, such as multi-level modulator, for nonplanar or wearable applications. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/2053-1591/aadecaAdditional details
Identifiers
Publishing Information
- Journal Title
- Materials Research Express (Online)
- Journal Volume
- 5
- Journal Issue
- 11
- Journal Page Range
- [7 p.]
- ISSN
- 2053-1591
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51086020
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DIELECTRIC MATERIALS; EQUIPMENT; FIELD EFFECT TRANSISTORS; FLEXIBILITY; GRAPHENE
- Descriptors DEC
- CARBON; ELEMENTS; MATERIALS; MECHANICAL PROPERTIES; NONMETALS; SEMICONDUCTOR DEVICES; TENSILE PROPERTIES; TRANSISTORS