Angular distribution of particles sputtered by slow ions

The spatial distribution of the particles, sputtered from the copper polycrystal by the Xe-ions with the energy of E0=300 eV by the normal and inclined incidence is studied through the molecular dynamics method and experimentally. The sputtering coefficients and angular distributions of the sputtered particles by the Cu bombardment through the Xe and Ar slow ions are calculated. It is shown that the ratio of the coefficients of the copper sputtering through the xenon and argon ions depends on the ions energy and incidence angle. The obtained experimental and calculation angular distributions of the secondary particles are anisotropic and significantly differ by form in ions incidence plane and in the plane perpendicular thereto. The calculation of the energy spectra and emitted ions generations is carried out. The mechanism of the target surface ions and peculiarities of the obtained angular distributions are analyzed