Microwave discharge excitation of XeO
Description
The authors describe microwave discharge excitation of XeO excimers achieved using a microwave resonant cavity at 2.45 GHz. The green bands between 480-580 nm corresponding to XeO(1S) → XeO(1D) and the ultraviolet bands between 290-320 nm corresponding to XeO(1S) → XeO(3P) were observed with a 1 meter spectrograph coupled to an intensified, optical multichannel analyzer. The TM012 resonant mode of the cavity was used to couple 100 Watts of cw, 2.45 GHz, microwave power to xenon at pressures ranging from 1 to 760 torr. A quartz tube (2.5 cm diameter) placed co-axially with the center of the microwave cavity (l.D. of 17.8 cm, length about 14.5 cm depending upon the pressure) contained the xenon and small impurities of air (2-10 millitorr). The XeO excimer was observed to be produced near the wall of the quartz containment tube and at the nodes of the electric field where the discharge is believed to be at its coolest and at low xenon pressures (2 - 10 Torr)
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- Conference record of the 1988 IEEE international conference on plasma science (abstracts)
- Imprint Pagination
- 160 p.
- Journal Page Range
- p. 80.
Conference
- Title
- IEEE international conference on plasma science.
- Dates
- 6-8 Jun 1988.
- Place
- Seattle, WA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 21033293
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CAVITY RESONATORS; ELECTRIC FIELDS; ELECTRON-ATOM COLLISIONS; ELECTRONS; EXCIMER LASERS; EXCITED STATES; GROUND STATES; MICROWAVE RADIATION; OXYGEN; PLASMA PRODUCTION; THREE-BODY PROBLEM; XENON OXIDES
- Descriptors DEC
- AMPLIFIERS; ATOM COLLISIONS; CHALCOGENIDES; COLLISIONS; ELECTROMAGNETIC RADIATION; ELECTRON COLLISIONS; ELECTRONIC EQUIPMENT; ELEMENTARY PARTICLES; ELEMENTS; ENERGY LEVELS; EQUIPMENT; FERMIONS; GAS LASERS; LASERS; LEPTONS; MANY-BODY PROBLEM; NONMETALS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; RARE GAS COMPOUNDS; RESONATORS; XENON COMPOUNDS
Optional Information
- Notes
- Imprint:Technical Paper 3P7.
- Secondary number(s)
- CONF-880651--.