Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets

This article reports on the pecularities of Cr and Cu coatings deposited by magnetron sputtering with hot and evaporative targets. There is shown the role of heat radiation from hot (evaporative) target and sublimated particle flux in energy flux density on the substrate and deposition rates. The Cr and Cu films were investigated by X-ray diffraction, scanning electron microscopy, nanoindentation, electrical conductivity and corrosion tests. (paper)