Strain-dependence of the structure and ferroic properties of epitaxial Ni1−xTi1−yO3 thin films grown on sapphire substrates
Creators
- 1. Environmental Molecular Sciences Laboratory, Richland, WA (United States)
- 2. Fundamental and Computational Sciences Directorate, Pacific Northwest National Laboratory, Richland, WA (United States)
- 3. Louisiana State University, Baton Rouge, LA (United States)
Description
Polarization-induced weak ferromagnetism has been predicted a few years back in compounds MTiO3 (M = Fe, Mn, Ni) (Fennie, 2008). We set out to stabilize this metastable, distorted perovskite structure by growing NiTiO3 epitaxially on sapphire Al2O3 (001) substrate, and to control the polar and magnetic properties via strain. Epitaxial Ni1−xTi1−yO3 films of different Ni/Ti ratios and thicknesses were deposited on Al2O3 substrates by pulsed laser deposition at different temperatures, and characterized using several techniques. The effect of film thickness, deposition temperature, and film stoichiometry on lattice strain, film structure, and physical properties was investigated. Our structural data from x-ray diffraction, electron microscopy, and x-ray absorption spectroscopy shows that substrate-induced strain has a marked effect on the structure and crystalline quality of the films. Physical property measurements reveal a dependence of the Néel transition and lattice polarization on strain, and highlight our ability to control the ferroic properties in NiTiO3 thin films by film stoichiometry and thickness. - Highlights: • NiTiO3 epitaxial thin films with LiNbO3-type structure by pulsed laser deposition. • Strain varied by film thickness, stoichiometry, and synthesis temperature. • Systematic study of the effect of strain on film structure and physical properties. • Manipulation of ferroic properties by strain confirmed
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2015.02.016Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2015.02.016;
- PII
- S0040-6090(15)00132-7;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 578
- Journal Page Range
- p. 113-123
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47033184
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; ALUMINIUM OXIDES; CONCENTRATION RATIO; ENERGY BEAM DEPOSITION; EPITAXY; FERROMAGNETISM; LASER RADIATION; MAGNETIC PROPERTIES; NICKEL COMPOUNDS; POLARIZATION; PULSED IRRADIATION; STOICHIOMETRY; STRAINS; SUBSTRATES; SYNTHESIS; THICKNESS; THIN FILMS; TITANATES; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DEPOSITION; DIFFRACTION; DIMENSIONLESS NUMBERS; DIMENSIONS; ELECTROMAGNETIC RADIATION; FILMS; IRRADIATION; MAGNETISM; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SPECTROSCOPY; SURFACE COATING; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.