Published February 1973 | Version v1
Journal article Metadata-only

Resistor focusing of the injected electrons in the astron

Creators

Description

The net axial focusing force for a non-neutral cylindrical E layer in various Astron resistor configurations is calculated. There is strong focusing for cases in which there are resistors on the cantilever.

Additional details

Identifiers

DOI
10.1063/1.1662239;

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
44
Journal Issue
2
Series
J. Appl. Phys.
Journal Page Range
660-661
ISSN
0021-8979

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
4074885
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ASTRON; BEAM INJECTION; BEAM OPTICS; E LAYER; ELECTRON BEAMS; FOCUSING; RESISTORS
Descriptors DEC
BEAMS; ELECTRICAL EQUIPMENT; LEPTON BEAMS; PARTICLE BEAMS; THERMONUCLEAR DEVICES

Optional Information

Notes
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