Published April 1984 | Version v1
Journal article Metadata-only

Plasma treatment induced changes of dissolution kinetics of chromium

Creators

  • 1. Ceskoslovenska Akademie Ved, Prague. Ustav Fyzikalni Chemie a Elektrochemie J. Heyrovskeho

Description

Exposures of chromium films to argon and freon 114 plasmas were found to modify chromium dissolution kinetics which was measured by following the removal of an implanted radioactive marker during gradual dissolution. The effect is attributed to surface layers (oxide and fluoride) formed by sputtering and plasma reactions. A possible application of this effect in manufacturing fine structure chromium masks through wet chemical etching is indicated. (author)

Additional details

Publishing Information

Journal Title
Radiat. Eff. Lett.
Journal Volume
86
Journal Issue
4
Series
Radiat. Eff. Lett.
Journal Page Range
121-125
ISSN
0142-2448

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
15055738
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ARGON; CARBON; CERIUM SULFATES; CHEMICAL REACTION KINETICS; CHROMIUM; CHROMIUM OXIDES; DISSOLUTION; ETCHING; FILMS; FREONS; NITRIC ACID; PLASMA; RADIATION SOURCE IMPLANTS; SILICON; SPUTTERING; SURFACE COATING
Descriptors DEC
CERIUM COMPOUNDS; CHALCOGENIDES; CHROMIUM COMPOUNDS; DEPOSITION; ELEMENTS; HYDROGEN COMPOUNDS; IMPLANTS; INORGANIC ACIDS; KINETICS; METALS; NITROGEN COMPOUNDS; NONMETALS; ORGANIC COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; RADIATION SOURCES; RARE EARTH COMPOUNDS; RARE GASES; REACTION KINETICS; SEMIMETALS; SULFATES; SULFUR COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS