Published October 2021 | Version v1
Journal article

Electropositive carbon sites and sulfur vacancies in SnS2/g-C3N4 for achieving adsorption and photocatalytic degradation of As(III) in stages by pH regulation

  • 1. College of Science, Central South University of Forestry and Technology, Changsha 410004 (China)
  • 2. School of Nuclear Technology and Chemistry & Biology, Hubei University of Science and Technology, Xianning 437100 (China)

Description

Highlights: • 37.4% pyrrole nitrogen doping generates electropositive carbon sites in g-C3N4. • Sn-based sulfide was grown on the N‒C bond framework of porous pyrrole in situ. • The Sn valence state was adjusted by β particles to obtain controllable sulfur defects. • The −CSn− interface chemical bond improves the transport of carriers. • Enhanced arsenic removal from water was achieved in stages by pH regulation. -- Abstract: In this work, a high content of pyrrole nitrogen carbon nitride (HPCN)-SnS2 has been successfully constructed with −CSn− chemical bond as the interface framework. The charge state of Sn species was adjusted by β particles to obtain controllable sulfur defects onto the HPCN-SnS2 through electron beam irradiation (EBI). The composites exhibited excellent photocatalytic oxidation capacity of As(Ⅲ) and adsorption capacity of As(Ⅴ). It is confirmed that the optimized HPCN-SnS1.38 can remove the total As concentrations below 0.40 mg/L within 80 min. Additionally, the effect of various conditions (pH value and type of anions) was evaluated using degradation experiments, and HPCN-SnS1.38 could be reused at least 5 times without an obvious reduction in the photocatalysis and adsorption performances. Based on the experimental results, the photocatalytic mechanism of As(Ⅲ) by HPCN-SnS2 after electron beam irradiation was studied. Free radical quenching experiments and electron paramagnetic resonance (EPR) showed that the oxidation of As(III) under visible light is mainly controlled by • O2 and • OH, and • OH is converted from • O2 under acidic conditions.

Additional details

Identifiers

DOI
10.1016/j.jallcom.2021.160292;
PII
S0925838821017011;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
877
Journal Page Range
vp.
ISSN
0925-8388
CODEN
JALCEU

Optional Information

Copyright
Copyright (c) 2021 Elsevier B.V. All rights reserved.