Published December 1, 2004 | Version v1
Miscellaneous

Impedance characteristics of LF driven ferroinductor coupled discharge

  • 1. Department of Physics, Technion Israel Institute of Technology Haifa (Israel)

Description

Full Text:We present impedance characteristics of a Low Frequency inductively coupled discharge where instead of an inductor-like RF antenna we used a ferromagnetic core with a primary winding (ferroinductor). A dense (>1012 cm-3), highly ionized ( 30-40%) plasma was obtained in this ferroinductor at gas pressures as low as 10-4 Torr. In a wide frequency range the core and winding losses were found to be low compared to the LF power delivered to the plasma. The driving frequency could be very low compared to typical inductively coupled discharges. The input impedance was found to be almost purely active (cosφ 0.9), and it was possible to achieve various input resistances (e.g. 50 Ohm in the whole investigated range of frequencies, powers and pressures, which made unnecessary any matching box between the LF driver and the ferroinductor coupled plasma device. Such a combination of properties makes this kind of discharge attractive for many applications

Part of:
50. annual meeting of the Israel Physical Society, book of abstracts

Additional details

Publishing Information

Imprint Place
Haifa (Israel)
Imprint Title
2004 annual meeting of the Israel Physical Society
Imprint Pagination
179 p.
Journal Volume
50
Series
Bulletin of the Israel Physical Society
Journal Page Range
p. 107

Conference

Title
2004 annual meeting of the Israel Physical Society
Dates
1 Dec 2004
Place
Haifa (Israel)

INIS

Country of Publication
Israel
Country of Input or Organization
Israel
INIS RN
37103806
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference, Non-conventional Literature
Descriptors DEI
ELECTRIC IMPEDANCE; ELECTRIC SPARKS; LONG WAVE RADIATION; PLASMA DENSITY; PLASMA PRODUCTION; PRESSURE RANGE MILLI PA; SOLENOIDS
Descriptors DEC
ELECTRIC COILS; ELECTRIC DISCHARGES; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; EQUIPMENT; IMPEDANCE; PRESSURE RANGE; RADIATIONS; RADIOWAVE RADIATION

Optional Information