Published 1999
| Version v1
Journal article
Analysis of the Diffusion with Negative Ions in a SF6 Plasma
- 1. Dipartimento di Fisica Occhialini, Universita degli Studi di Milano-Bicocca e INFM, Milano (Italy)
Description
The SF6 plasma produced in a RF discharge device for surface treatment was studied by means of Langmuir probes. The relevant plasma parameters are extracted from the probe characteristics and the data are compared with the prediction of a numerical simulation of the reactor kinetics. As a results some insight on the relevant diffusion rate in such an electronegative plasma and on the interplay between recombination and diffusion processes is reached. (author)
Additional details
Publishing Information
- Journal Title
- Journal of Technical Physics
- Journal Volume
- 40
- Journal Issue
- 1,suppl
- Journal Page Range
- p. 221-224
- ISSN
- 0324-8313
Conference
- Title
- International Symposium PLASMA'99
- Acronym
- Research and Application of Plasmas
- Dates
- 7-9 Jul 1999
- Place
- Warsaw (Poland)
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 32029864
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHARGED-PARTICLE TRANSPORT; DIFFUSION; ELECTRIC DISCHARGES; ELECTRON DENSITY; ELECTRON TEMPERATURE; ION DRIFT; LABORATORY EQUIPMENT; LANGMUIR PROBE; PLASMA; PLASMA DIAGNOSTICS; PLASMA SIMULATION; RF SYSTEMS; SULFUR FLUORIDES; SURFACE TREATMENTS
- Descriptors DEC
- ELECTRIC PROBES; EQUIPMENT; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; PROBES; RADIATION TRANSPORT; SIMULATION; SULFUR COMPOUNDS
Optional Information
- Notes
- 9 refs, 2 figs