Residual stress in ion implanted titanium nitride studied by parallel beam glancing incidence x-ray diffraction
- 1. Martin Marietta, Denver, CO (United States)
- 2. ISM Technologies, Inc., San Diego, CA (United States)
- 3. Charles Univ., Prague (Czechoslovakia)
Description
Ion implantation is known to increase the lifetime of cutting tools. Current theories are the increase in lifetime is caused by an increase in the residual stress, or by work hardening of the surface associated with the implantation. In this work the effect of ion implantation on the residual stress in titanium nitride coatings made by the standard industrial methods of chemical and physical vapor deposition (CVD and PVD) is studied. It is found in the as-received condition (unimplanted), the residual stress levels are near zero for CVD materials and highly compressive, of the order of 6 GPa, for PVD materials. Ion implantation has no effect on the residual stress in the coatings made by CVD. Nitrogen does increase the compressive residual stress by some 10% in the near surface regions of PVD coatings, while nickel-titanium dual metal ion implantation does not have any effect. It appears that the lifetime increase is not associated with residual stress effects
Additional details
Publishing Information
- Journal Title
- Advances in X-Ray Analysis
- Journal Volume
- 38
- Journal Page Range
- p. 471-478.
- ISSN
- 0376-0308
- CODEN
- AXRAAA
Conference
- Title
- 43. annual Denver x-ray conference on applications of x-ray analysis.
- Dates
- 1-5 Aug 1994.
- Place
- Steamboat Spring, CO (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 27080354
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ION IMPLANTATION; RARE GASES; RESIDUAL STRESSES; TITANIUM NITRIDES; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; ELEMENTS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; SCATTERING; STRESSES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Secondary number(s)
- CONF-9408178--.