Published 1990 | Version v1
Book

Amorphous silicon large area electronics

Creators

  • 1. Xerox Palo Alto Research Center, CA (United States)

Description

Large area electronics is a recently established technology for optical scanners and liquid crystal displays. The devices are fabricated from deposited thin films because size requirements prevent the use of single crystal silicon substrates. This technology has potential applications in medical imaging and high energy particle physics. Hydrogenated amorphous silicon (a-Si:H) satisfies the requirements for large area electronics. This material is deposited on glass, and can be fabricated into field effect transistors, light senors and other circuit elements. This paper describes the structure and performance of the individual a-Si:H device elements, the processing of large arrays and some anticipated future improvements in materials and devices

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
IEEE nuclear science symposium conference record emdash 1990
Imprint Pagination
1636 p.
Journal Page Range
p. 250.

Conference

Title
1990 Institute of Electrical and Electronics Engineers (IEEE) nuclear science symposium.
Dates
22-27 Oct 1990.
Place
Arlington, VA (USA).

Optional Information

Secondary number(s)
CONF-9010220--.