Published 1980
| Version v1
Report
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Aspects of the physics, chemistry, and technology of high intensity heavy ion sources
Description
Particular emphasis is placed on the technology of plasma discharge ion sources which utilize solid elemental or molecular compounds to produce vapor for the ionization process. A brief discussion is made of the elementary concepts underlying the formation and extraction of ion beams from plasma discharge sources. A limited review of low charge state positive ion sources suitable for accelerator use is also given
Availability note (English)
MF available from INIS under the Report Number; Available from NTIS., PC A05/MF A01.Files
11566570.pdf
Files
(1.6 MB)
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Additional details
Publishing Information
- Imprint Pagination
- 80 p.
- Report number
- CONF-800738--1
Conference
- Title
- equipment and technique.
- Acronym
- 3. international conference on ion implantation
- Dates
- 8 - 11 Jul 1980.
- Place
- Kingston, Ontario, Canada.
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 11566570
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS; S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM EXTRACTION; ELECTRIC DISCHARGES; HEAVY IONS; ION SOURCES; PLASMATRONS; REVIEWS
- Descriptors DEC
- CHARGED PARTICLES; DOCUMENT TYPES; ELECTRON TUBES; IONS