Published 1980 | Version v1
Report Open

Aspects of the physics, chemistry, and technology of high intensity heavy ion sources

Description

Particular emphasis is placed on the technology of plasma discharge ion sources which utilize solid elemental or molecular compounds to produce vapor for the ionization process. A brief discussion is made of the elementary concepts underlying the formation and extraction of ion beams from plasma discharge sources. A limited review of low charge state positive ion sources suitable for accelerator use is also given

Availability note (English)

MF available from INIS under the Report Number; Available from NTIS., PC A05/MF A01.

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Additional details

Publishing Information

Imprint Pagination
80 p.
Report number
CONF-800738--1

Conference

Title
equipment and technique.
Acronym
3. international conference on ion implantation
Dates
8 - 11 Jul 1980.
Place
Kingston, Ontario, Canada.

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
11566570
Subject category
S74: ATOMIC AND MOLECULAR PHYSICS; S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BEAM EXTRACTION; ELECTRIC DISCHARGES; HEAVY IONS; ION SOURCES; PLASMATRONS; REVIEWS
Descriptors DEC
CHARGED PARTICLES; DOCUMENT TYPES; ELECTRON TUBES; IONS