The kinetic energy of atoms deposited by ion beam sputtering

The kinetic energies of aluminum and cobalt atoms, deposited by Ion Beam Sputtering (IBS) method, were investigated. The sum of the kinetic energy and condensing energy of the atoms was measured by the calorimetric method. The obtained kinetic energies increased with increasing the ion energy, and changed with the difference of ion species such as Ar, Kr, or Xe, and were in the range of 14 - 31 eV for aluminum atoms, and 15 - 38 eV for cobalt atoms. In addition, the relation between the crystal growth of films and the kinetic energy was also studied. We found that the X-ray diffraction intensity of the aluminum crystal plane (111) and cobalt crystal plane (100) increased when the kinetic energy of each atom increased. (author)