Published 1988
| Version v1
Journal article
Interaction of an ion beam with the target in electron microscope applications
- 1. Kogakuin Univ., Tokyo (Japan). Dept. of Electrical Engineering
Description
Universal curves relating the energy loss and sputtering yield of energetic ions in solids to the incident energy have been derived using the power potential law of Lindhard. A diffusion model of an ion beam penetrating a solid is proposed which is found to agree well with empirical data on ion beam penetration, energy dissipation profiles and the backscattering coefficient as a function of reduced depth. Using this model, the total secondary electron emission yield due to both primary and backscattered ions is obtained and radiation damage in ion beam applications is evaluated. (author)
Additional details
Publishing Information
- Journal Title
- Micron Microsc. Acta
- Journal Volume
- 19
- Journal Issue
- 2
- Series
- Micron Microsc. Acta.
- Journal Page Range
- 87-103
- CODEN
- MMACD
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 19074190
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BACKSCATTERING; DIFFUSION; ELECTRONS; ENERGY LOSSES; ION BEAMS; MATHEMATICAL MODELS; PHYSICAL RADIATION EFFECTS; SECONDARY EMISSION; SOLIDS; SPUTTERING
- Descriptors DEC
- BEAMS; ELEMENTARY PARTICLES; EMISSION; FERMIONS; LEPTONS; RADIATION EFFECTS; SCATTERING