Published 1988 | Version v1
Journal article

Interaction of an ion beam with the target in electron microscope applications

  • 1. Kogakuin Univ., Tokyo (Japan). Dept. of Electrical Engineering

Description

Universal curves relating the energy loss and sputtering yield of energetic ions in solids to the incident energy have been derived using the power potential law of Lindhard. A diffusion model of an ion beam penetrating a solid is proposed which is found to agree well with empirical data on ion beam penetration, energy dissipation profiles and the backscattering coefficient as a function of reduced depth. Using this model, the total secondary electron emission yield due to both primary and backscattered ions is obtained and radiation damage in ion beam applications is evaluated. (author)

Additional details

Publishing Information

Journal Title
Micron Microsc. Acta
Journal Volume
19
Journal Issue
2
Series
Micron Microsc. Acta.
Journal Page Range
87-103
CODEN
MMACD