Published 2003 | Version v1
Book

An experimental study of argon plasma in aluminium coated plasma chamber of 6.4 GHz ECR ion source at VECC

  • 1. Variable Energy Cyclotron Centre, Bidhannagar, Kolkata (India)

Description

A multiply charged two stage 6.4 GHz Electron Cyclotron Resonance (ECR) ion source was developed in VECC a few years ago. It was modified in phases based on magnetic topology, microwave feed and external supply of cold electrons to improve the ion production performance. In the present experimental study electron repeller biased disc as Langmuir probe was used to understand the electron repeller effect in aluminum coated plasma chamber of 6.4 GHz ECR ion source. Here, the repeller aluminium disc placed on the axis of the plasma chamber has been biased with respect to the floating plasma chamber. Probe current and ion current of Ar+ were measured at different bias voltages and currents for a particular discharge condition. The discharge condition was varied by changing only microwave power heating the plasma but the mirror magnetic field and gas feed remained unchanged throughout the experiment

Part of:
Proceedings of the DAE-BRNS Indian particle accelerator conference-2003

Additional details

Publishing Information

Publisher
Allied Publishers Pvt. Ltd.
Imprint Place
New Delhi (India)
ISBN
81-7764-407-6
Imprint Title
Proceedings of the DAE-BRNS Indian particle accelerator conference-2003
Imprint Pagination
773 p.
Journal Page Range
p. 175-176

Conference

Title
1. DAE-BRNS Indian particle accelerator conference
Acronym
InPAC-2003
Dates
3-6 Feb 2003
Place
Indore (India)

INIS

Country of Publication
India
Country of Input or Organization
India
INIS RN
35008139
Subject category
S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ARGON IONS; CHARGE DISTRIBUTION; ECR ION SOURCES; ELECTRON CYCLOTRON-RESONANCE; ELECTRON EMISSION; GHZ RANGE 01-100; MAGNETIC FIELDS; MICROWAVE HEATING; PERFORMANCE TESTING
Descriptors DEC
CHARGED PARTICLES; CYCLOTRON RESONANCE; EMISSION; FREQUENCY RANGE; GHZ RANGE; HEATING; ION SOURCES; IONS; RESONANCE; TESTING

Optional Information

Notes
7 refs., 4 figs., 1 tab.