Published February 2008
| Version v1
Journal article
Microstructure of CoNiFeB electroless-deposited soft magnetic underlayer for perpendicular recording media
- 1. National Institute for Material Science, 1-2-1 Sengen, Tsukuba 305-0047 (Japan)
- 2. Shin-Etsu Chemical Co., Ltd., Takefu-shi, Fukui 915 (Japan)
Description
The microstructure of a CoNiFeB film for a soft magnetic underlayer of perpendicular recording media, which was deposited by electroless plating on a Si wafer, has been investigated by transmission electron microscopy and a three-dimensional atom probe. After the deposition of the CoNiFeB film on a Ni underlayer, Hc decreased from about 62 to about 3 Oe. Based on the microstructure observation results, the decrease of Hc was concluded to be the result of reduced magneto-elastic energy. The good adhesiveness between the soft underlayer (SUL) and the Si substrate was found to be due to the composition gradient
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jmmm.2007.07.007Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2007.07.007;
- PII
- S0304-8853(07)00808-6;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 320
- Journal Issue
- 3-4
- Journal Page Range
- p. 490-495
- ISSN
- 0304-8853
- CODEN
- JMMMDC
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39063972
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- BORON ALLOYS; COBALT ALLOYS; FILMS; IRON ALLOYS; MICROSTRUCTURE; NICKEL ALLOYS; PLATING; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- ALLOYS; DEPOSITION; ELECTRON MICROSCOPY; MICROSCOPY; SURFACE COATING; TRANSITION ELEMENT ALLOYS
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.