Published November 5, 1982 | Version v1
Patent

Method of controlling plasma discharge in a thermonuclear device

  • 1. Japan Atomic Energy Research Inst., Tokyo

Description

Purpose: To prolong the plasma discharging period by previously increasing the temperature at the thick portion of a vacuum container prior to the plasma discharge to thereby decrease the temperature difference caused by the plasma discharge between the thick portion and the bellows. Method: Temperature values at the outer surface of the thick portion and the bellows of a vacuum container detected by temperature sensors are applied to the input processing section of a temperature control device, and baking control is carried out by way of the output processing section so that each of the portions of the vacuum container may be maintained at the temperature set by the temperature setting section based on the calculation performed in the control processing section. By previously increasing the temperature β at the thick portion higher by about 1000C than the temperature α for the bellows in the baking treatment prior to the plasma discharge, the plasma discharge period during which the temperature levels at both of the portions are reversed after the plasma discharge and the temperature difference arrives at a predetermined level i.g., of 1000C can significantly be prolonged as compared with the case where the plasma discharge is started at the same temperature for both of the portions. (Yoshino, Y.)

Availability note (English)

Available from JAPATIC. Also available from INPADOC.

Additional details

Publishing Information

Imprint Pagination
3 p.
IPC:
Int. Cl. G21B1/00; H05H1/12.
IPC
Int. Cl. G21B1/00; H05H1/12.
Patent number
JP patent document 57-179688/A/

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
15054567
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
BELLOWS; CONTAINERS; CONTROL SYSTEMS; ELECTRIC DISCHARGES; PLASMA; SPATIAL DISTRIBUTION; TEMPERATURE DEPENDENCE; THERMONUCLEAR DEVICES; VACUUM SYSTEMS
Descriptors DEC
DISTRIBUTION

Optional Information

Secondary number(s)
JP patent application 56-64168.