Published December 1979 | Version v1
Journal article

Rotating plasma device, G-II device

  • 1. Ibaraki Univ., Hitachi (Japan). Faculty of Engineering

Description

A rotating plasma device (G-II Device) was constructed for the study of multicomponent plasma under the influence of large acceleration. The experiments were performed for He at the initial pressure ranged from 0.01 to 0.1 Torr. The parameters of the rotating plasma are as follows: density n = 10sup(14 -- 15)/cc, temperature T sub(e) asymptotically equals T sub(i) = 5 x 10 eV, plasma rotation v sub(phi)/2πr asymptotically equals 105 r.p.s. and acceleration v sub(phi)sup(2)/r asymptotically equals 0.2 x 1010 m/sec2. (author)

Additional details

Publishing Information

Journal Title
Ibaraki Daigaku Kogakubu Kenkyu Shuho
Journal Volume
27
Series
Ibaraki Daigaku Kogakubu Kenkyu Shuho.
Journal Page Range
105-111
ISSN
0367-7389

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
13649142
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ELECTROSTATIC PROBES; MAGNET COILS; MAGNETIC FIELDS; MAGNETIC PROBES; PLASMA; PLASMA DRIFT; ROTATION; SPECIFICATIONS; THERMONUCLEAR DEVICES; VACUUM SYSTEMS
Descriptors DEC
ELECTRIC COILS; ELECTRICAL EQUIPMENT; PROBES