Published June 1987
| Version v1
Report
Electron attachment phenomena in heated plasmas
Creators
- 1. California Institute of Technology, Pasadena
Description
Recent JPL experimental and theoretical results of electron attachment to molecules at ultralow energies are discussed. Specifically, electron attachment to F2, and temperature dependencies of attachment rate constants in CFCl3 and CCl4 are used to illustrate some interesting features. Extensions to several important areas involving plasma-surface interactions are outlined
Additional details
Publishing Information
- Imprint Title
- Proceedings of the fifth symposium on energy engineering sciences: Instrumentation, diagnostics, and material behavior
- Journal Page Range
- p. 13-18.
- Report number
- CONF-8706187--
Conference
- Title
- 5. Symposium on energy engineering sciences.
- Dates
- 17-19 Jun 1987.
- Place
- Argonne, IL (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 19057737
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CARBON COMPOUNDS; ELECTRON ATTACHMENT; INTERACTIONS; MOLECULES; PLASMA; RESEARCH PROGRAMS; SURFACES