Characterization techniques for ion bombarded insulators

This chapter reviews characterization techniques that are commonly used for ion bombarded insulators. Most ion implantation research has been carried out on metal or semiconductor targets with much less attention being paid to implanted insulators and thus most of the characterization methods that have been developed have been applied primarily to metals and semiconductors. Some of these methods are also useful for ion bombarded insulators, but here may be techniques useful for metals and semiconductors which are not discussed here because they are not particularly applicable to insulators. In general, only widely used analytical methods are reviewed. There are certainly methods that are useful for particular applications, but if those techniques are not widely available or are useful only for very specialized research applications, they are probably not included in this chapter. Many of the examples presented in this chapter are taken from the Proceeding of the Radiation Effects in Insulators Conferences which are excellent sources of information on the various types of studies taking place in the field of ion bombarded insulators