Published August 8, 1994
| Version v1
Journal article
Transmission of low energy (<10 eV) O+ ions through several monolayer thick rare gas films
Creators
- 1. Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers---The State University of New Jersey, Piscataway, New Jersey 08855 (United States)
Description
We present the first systematic study of the transmission of low energy oxygen ions (<10 eV) through ultrathin films of Ar, Kr, and Xe. For rare gas films adsorbed on an oxidized W(100) surface, we find that a small fraction of O+ can penetrate more than 5 ML thick films of Kr and Xe. The attenuation of O+ is strongest for Ar overlayers. We attribute the attenutation to elastic scattering mainly of the ions with the rare gas atoms. We suggest that structural characteristics of rare gas films adsorbed on this surface are the cause for low attenuation in the first 1-2 monolayers
Additional details
Publishing Information
- Journal Title
- Physical Review Letters
- Journal Volume
- 73
- Journal Issue
- 6
- Journal Page Range
- p. 794-797.
- ISSN
- 0031-9007
- CODEN
- PRLTAO
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 26014014
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Numerical Data
- Descriptors DEI
- ARGON; ATTENUATION; CATIONS; ELASTIC SCATTERING; ENERGY SPECTRA; EXPERIMENTAL DATA; FILMS; ION CHANNELING; KRYPTON; LAYERS; OXIDATION; OXYGEN IONS; RARE GASES; SURFACE CLEANING; SURFACES; TUNGSTEN; XENON
- Descriptors DEC
- CHANNELING; CHARGED PARTICLES; CHEMICAL REACTIONS; CLEANING; DATA; ELEMENTS; INFORMATION; IONS; METALS; NONMETALS; NUMERICAL DATA; SCATTERING; SPECTRA; SURFACE FINISHING; TRANSITION ELEMENTS