Strong bonding between sputtered bioglass–ceramic films and Ti-substrate implants induced by atomic inter-diffusion post-deposition heat-treatments
- 1. National Institute of Materials Physics, Bucharest-Magurele 077125 (Romania)
- 2. Department of Cellular and Molecular Medicine, "Carol Davila" University of Medicine and Pharmacy, Bucharest 050474 (Romania)
- 3. Army Centre for Medical Research, Bucharest 020012 (Romania)
- 4. Department of Materials and Ceramics Engineering, CICECO, University of Aveiro, Aveiro 3810-193 (Portugal)
Description
Bioglasses (BG) are the inorganic materials exhibiting the highest indices of bioactivity. Their appliance as films for bio-functionalization of metallic implant surfaces has been regarded as an optimal solution for surpassing their limited bulk mechanical properties. This study reports on magnetron sputtering of alkali-free BG thin films by varying the target-to-substrate working distance, which proved to play an important role in determining the films' properties. Post deposition heat-treatments at temperatures slightly above the glass transformation temperature were then applied to induce inter-diffusion processes at the BG/titanium substrate interface and strengthening the bonding as determined by pull-out adherence measurements. The morphological and structural features assessed by SEM–EDS, XRD, and FTIR revealed a good correlation between the formations of inter-metallic titanium silicide phases and the films' bonding strength. The highest mean value of pull-out adherence (60.3 ± 4.6 MPa), which is adequate even for load-bearing biomedical applications, was recorded for films deposited at a working distance of 35 mm followed by a heat-treatment at 750 °C for 2 h in air. The experimental findings are explained on the basis of structural, compositional and thermodynamic considerations.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2013.05.022Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2013.05.022;
- PII
- S0169-4332(13)00924-0;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 280
- Journal Page Range
- p. 530-538
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46003424
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BIOLOGICAL EFFECTS; CERAMICS; DEPOSITION; DIFFUSION; GLASS; HEAT TREATMENTS; IMPLANTS; INFRARED SPECTRA; INTERFACES; MAGNETRONS; PRESSURE RANGE MEGA PA; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SUBSTRATES; SURFACES; THIN FILMS; TITANIUM; TITANIUM SILICIDES; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; METALS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; PRESSURE RANGE; SCATTERING; SILICIDES; SILICON COMPOUNDS; SPECTRA; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.