Published February 1, 2011 | Version v1
Journal article

Dislocation cores in silicon: new aspects from numerical simulations

  • 1. Department of Physics and Mechanics of Materials, Institut Pprime, CNRS UPR 3346, Universite de Poitiers, SP2MI, BP30179, 86962 Futuroscope Chasseneuil (France)

Description

Recent theoretical investigations of the properties of dislocation cores in silicon are reviewed. New results, obtained from numerical simulations for the non-dissociated screw and 600 dislocations, are presented and discussed in relation with experiments.

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/281/1/012002

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
281
Journal Issue
1
Journal Page Range
[8 p.]
ISSN
1742-6596

Conference

Title
International conference on extended defects in semiconductors
Acronym
EDS 2010
Dates
19-24 Sep 2010
Place
Brighton (United Kingdom)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43044466
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COMPUTERIZED SIMULATION; CRYSTAL DEFECTS; DISLOCATIONS; FASTENERS; SILICON
Descriptors DEC
CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELEMENTS; LINE DEFECTS; SEMIMETALS; SIMULATION