Published April 2015 | Version v1
Journal article

A comparative study of radiofrequency antennas for Helicon plasma sources

  • 1. Center of Studies and Activities for Space (CISAS) "G Colombo", University of Padova, Padova,Italy (Italy)
  • 2. Faculty of Electrical Engineering, Eindhoven University of Technology, Eindhoven (Netherlands)

Description

Since Helicon plasma sources can efficiently couple power and generate high-density plasma, they have received interest also as spacecraft propulsive devices, among other applications. In order to maximize the power deposited into the plasma, it is necessary to assess the performance of the radiofrequency (RF) antenna that drives the discharge, as typical plasma parameters (e.g. the density) are varied. For this reason, we have conducted a comparative analysis of three Helicon sources which feature different RF antennas, namely, the single-loop, the Nagoya type-III and the fractional helix. These antennas are compared in terms of input impedance and induced current density; in particular, the real part of the impedance constitutes a measure of the antenna ability to couple power into the plasma. The results presented in this work have been obtained through a full-wave approach which (being hinged on the numerical solution of a system of integral equations) allows computing the antenna current and impedance self-consistently. Our findings indicate that certain combinations of plasma parameters can indeed maximize the real part of the input impedance and, thus, the deposited power, and that one of the three antennas analyzed performs best for a given plasma. Furthermore, unlike other strategies which rely on approximate antenna models, our approach enables us to reveal that the antenna current density is not spatially uniform, and that a correlation exists between the plasma parameters and the spatial distribution of the current density. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0963-0252/24/2/025024

Additional details

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
24
Journal Issue
2
Journal Page Range
[16 p.]
ISSN
0963-0252