Published October 15, 1991 | Version v1
Journal article

Critical parameters in the single-target sputtering of YBa2Cu3O7

  • 1. Westinghouse Science and Technology Center, 1310 Beulah Road, Pittsburgh, Pennsylvania (USA)

Description

The critical parameters in the single-target magnetron sputtering of YBa2Cu3O7 have been identified and sufficiently optimized to allow the reproducible deposition of films with Tc's of >90 K and Jc's of much-gt 106 A/cm2 at 77 K. It was found that during film growth the bombardment of the YBa2Cu3O7 by energetic particles must be minimized and also a stronger oxidizing agent than molecular oxygen must be present to obtain films with these properties. Otherwise, films are deposited that, by x-ray diffraction and energy dispersive x-ray spectroscopy analyses, are indistinguishable from the highest-Tc 1:2:3 stoichiometric material but which have critical temperatures of much-lt 90 K. Films need not have 1:2:3 overall stoichiometry to have optimum superconducting properties. In such cases the excess elements are present as second-phase particles

Additional details

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
70
Journal Issue
8
Series
J. Appl. Phys.
Journal Page Range
4383-4391
ISSN
0021-8979
CODEN
JAPIA