The effects of surface oxidation and fluorination of boron-doped diamond anodes on perchlorate formation and organic compound oxidation
- 1. Department of Civil and Environmental Engineering and Villanova Center for the Advancement of Sustainable Engineering (VCASE), Villanova University, Villanova, PA 19085 (United States)
- 2. Department of Chemical Engineering, University of Illinois at Chicago, 810 S. Clinton St., Chicago, IL 60607 (United States)
Description
This research investigated the effects of surface functional groups on both rates of organic compound oxidation (phenol, p-nitrophenol, benzoquinone, and oxalic acid) and perchlorate (ClO4−) formation at boron-doped diamond (BDD) film anodes at 20 °C. X-ray photoelectron spectroscopy measurements determined that various oxygenated functional groups (e.g., C-OH, C=O, COOH) were incorporated on the BDD surface by applying an anodic ageing process, and fluorine functional groups (e.g., C-F, -CnF2n+1) were incorporated by electrochemical oxidation of aqueous perfluorooctanoic acid solutions. Batch oxidation experiments revealed that ClO4− formation via the oxidation of ClO3− was highly variable during anodic ageing, which was attributed to changes in oxygenated functional groups, while organic compound oxidation rates were not significantly affected. The fluorinated electrode showed a lower ClO4− formation rate (19 ± 4 μmoles m−2 min−1) compared to the oxygenated electrode (436 ± 26 μmoles m−2 min−1) indicating the fluorinated surface limits ClO4− production. Measurement of the electrode response to the Fe(CN)63−/4− redox couple using cyclic voltammetry and electrochemical impedance spectroscopy indicated that lower ClO4− formation on the fluorinated electrode was likely a result of dipole-dipole interactions between the negatively charged F atoms and ClO3− and steric hindrance caused by the perfluorocarbon chains. This effect along with the hydrophobicity of the fluorinated electrode resulted in significantly lower ClO4− formation (96% decrease) while slightly enhancing measured oxidation rates of hydrophobic organic compounds. The use of benzoquinone as OH· probe confirmed that the fluorination process did not inhibit OH· production. The rate of benzoquinone oxidation was 2212 ± 183 μmoles m−2 min−1 on the oxygenated electrode and 2926 ± 201 μmoles m−2 min−1 on the fluorinated electrode. Density functional theory calculations indicated that the fluorination of the BDD surface by both F atoms and perfluorinated carbon radicals (·CnF2n+1) of varying chain lengths (n = 1 to 7) was feasible, and that the fluorinated edge sites (=C-CnF2n+1) were more electrochemically stable than fluorinated planar sites (≡C-CnF2n+1)
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2015.06.034Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2015.06.034;
- PII
- S0013-4686(15)01405-X;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 174
- Journal Page Range
- p. 1067-1078
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47058290
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ANODES; BORON; DENSITY FUNCTIONAL METHOD; DIAMONDS; DIPOLES; DOPED MATERIALS; FLUORINATION; FLUORINE; INTERACTIONS; NITROPHENOL; OXALIC ACID; OXIDATION; PERCHLORATES; PHENOL; SURFACES; VOLTAMETRY; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- AROMATICS; CALCULATION METHODS; CARBON; CARBOXYLIC ACIDS; CHEMICAL REACTIONS; CHLORINE COMPOUNDS; DICARBOXYLIC ACIDS; ELECTRODES; ELECTRON SPECTROSCOPY; ELEMENTS; HALOGEN COMPOUNDS; HALOGENATION; HALOGENS; HYDROXY COMPOUNDS; MATERIALS; MINERALS; MULTIPOLES; NITRO COMPOUNDS; NONMETALS; ORGANIC ACIDS; ORGANIC COMPOUNDS; ORGANIC NITROGEN COMPOUNDS; OXYGEN COMPOUNDS; PHENOLS; PHOTOELECTRON SPECTROSCOPY; SEMIMETALS; SPECTROSCOPY; VARIATIONAL METHODS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.